JMSSJ On-line, Vol. 45 (1997) No. 2, pp. 187-199

SIMS Applications for Electronic Materials		>> Full Text PDF >> References
Kazuyoshi TSUKAMOTO, Hiromi MORITA, Fumiyo TOUJOU, Sumikazu YOSHIKAWA, and Yoshiaki YOSHIOKA Characterization Technology Group, Matsushita Technoresearch Inc. (3-1-1 Yagumo-nakamachi, Osaka 570, Japan)
Current problems and applications of SIMS analysis for electronic materials, especially for semiconductors are discussed from the viewpoint of in-depth profile, micro area and trace analysis and quantification. Static-SIMS and SNMS which are presently being developed as new analytical techniques are also reviewed and those applications for semiconductor materials are shown.
Key words: SIMS, Depth profile, Micro area analysis, Trace analysis, Static-SIMS, TOF-SIMS, SNMS

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