JMSSJ On-line, Vol. 46 (1998) No. 4, pp. 292-295
TG-DTA-MS of Indium Acetate
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    Yutaka SAWADA,*a) Taro SHIGARAKI,a) Shigeyuki SEKI,a) Makoto OGAWA,a) Tetsuya SENDA,b) Toshikazu NISHIDE,c) and Jun-ichi MATSUSHITAd)

    *a) Department of Industrial Chemistry, Faculty of Engineering, Tokyo Institute of Polytechnics (1583 Iiyama, Atsugishi, Kanagawa 243-0297, Japan) b) Rigaku Co., Ltd. (3 Matsubara, Akishima, Tokyo 196-8666, Japan) c) Department of Industrial Chemistry, College of Engineering, Nihon University (Tamura, Koriyama-shi, Fukushima 963-8642, Japan) d) Department of Applied Chemistry, School of Engineering, Tokai University), 1117 Kitakaname, Hiratsuka-shi, Kanagawa 259-1292, Japan)

Indium acetate, a promising material for producing indium oxide films (Indium-Tin-Oxide transparent conductive films) by a dip coating, was synthesized and analyzed. The process of oxide formation in nitrogen and helium atmosphere was investigated by so-called TG-DTA-MS, i.e., thermogravimetry (TG) and differential thermal analysis (DTA) coupled with Evolved Gas Analysis (EGA) by mass spectrometry (MS) operated simultaneously. The thermal decomposition proceeded by gas evolution of water vapor and acetic acid followed by gas evolution of acetone and carbon dioxide at the higher temperature. The process in air atmosphere terminated at slightly earlier with an exothermic mass loss accompanying a rapid evolution of acetone, water vapor, and carbon dioxide; the evolved heat by combustion of acetone seemed to accelerate the thermal decomposition. The formula for indium acetate was estimated to be InOH (CH3COO)2 (basic acetate) by which the above reactions were explained satisfactorily.

Key words: Indium acetate, Transparent conductive films, Dipcoating, Indium oxide, TG-DTA-MS, EGA

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