| Metastable Ion Study of Organosilicon Compounds. Part XII. 2-Propoxytrimethylsilane, (CH3)3SiOCH(CH3)2 |
>> Full Text PDF
>> References |
|
† This paper is dedicated to the late Professor Akira TATEMATSU. *a) Chemistry and Materials Science, Gunma National College of Technology (Maebashi, Gunma 371-8530, Japan) |
||
| Unimolecular decomposition of 2-propoxytrimethylsilane, (CH3)3SiOCH(CH3)2 (Mw: 132, 1), upon electron impact ionization, has been studied by use of mass-analyzed ion kinetic energy (MIKE) spectrometry and D-labeling technique. The abundance of the molecular ion of 1 is too low to measure the MIKE spectrum. A methyl radical loss occurs from two different groups in 1+.; i.e., from either trimethylsilyl group or 2-propyl group. The ion at m/z 117 formed via the latter reaction decomposes into the m/z 73 ion, trimethylsilyl ion, by the loss of acetaldehyde, whereas the ion via the former reaction decomposes exclusively into the m/z 75 ion, hydroxydimethylsilyl ion, by the loss of propene. The methyl loss from the trimethylsilyl group prevails over that from the 2-propyl one. | ||
| Key words: Organosilicon compound, MIKE, D-Labeling, Ionneutral complex | ||
| [ Full Text PDF ] [ References ] |
| © COPYRIGHT by The Mass Spectrometry Society of Japan. All Rights Reserved. |