| Negative Chemical Ionization Mass Spectrometric Study on the Dissociative Electron Attachment to Halogenated Ethane |
>> Full Text PDF
>> References |
|
a)Tokyo Metropolitan Industrial Technology Research Institute Radiation Laboratory (Fukazawa ,Setagaya-ku ,Tokyo 158-0081 ,Japan ) |
||
| The temperature dependence for the formation of negative ions from Cl2BrC-CBrCl2, FClBrC-CBrF2, and ClBr2C-CF3 was studied using negative chemical ionization mass spectrometry. Halide ions and halogen molecular anions were observed. The intensity ratios between the halide ions and halogen molecular anions were almost equal to F2BrC-CBrF2. Halogen molecular anions are produced from halogen atoms presented by each C atom: the four-center elimination. The temperature dependence of the ion intensity ratios, Br-/Cl- and Br2-/BrCl-, suggests that the strength of the bonding energy of the C-Cl relative to C-Br increases in the order of Cl2BrC-CBrCl2<FClBrC-CBrF2<ClBr2C-CF3. | ||
| Key words: Temperature dependence,Dissociative electron attachment,Negative chemical ionization,Halogenated ethane | ||
| [ Full Text PDF ] [ References ] |
| © COPYRIGHT by The Mass Spectrometry Society of Japan. All Rights Reserved. |